Projection lens is an important part of the lithography machine, directly affect the lithography technology index, so the wave aberration of the projection lens is one of the most important indexes of the lithography machine. Transverse shearing interferometry is an important method of wave aberration detection. Base on the transverse shear principle, a high precision motion control and image acquisition system is designed to detect whether the wave aberration of the projection lens is satisfied. And the macro-micro structure is adopted to meet the requirements of both stroke and position precision，and Real-time acquisition by the CMOS image detector to save the shear interference image. The wave front aberration of the projection objective is calculated by wave front reconstruction. The experimental results satisfy the requirement of the aberration of the wave aberration. The system is highly integrated, scalable, easy to operate and easy to maintain features, can be widely used in related fields.